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- fabricacion microelectrica 26 Treffer
- fabrication microelectronique 26 Treffer
- fabrication microelectronique (technologie des materiaux et des surfaces) 26 Treffer
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45 weitere Werte:
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- complementary mos technology 17 Treffer
- recocido 17 Treffer
- recuit 17 Treffer
- technologie mos complementaire 17 Treffer
- tecnologia mos complementario 17 Treffer
- policristal 15 Treffer
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- transistors 14 Treffer
- caracteristica electrica 12 Treffer
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- electrical characteristic 12 Treffer
- resistividad capa 12 Treffer
- resistivite couche 12 Treffer
- sheet resistivity 12 Treffer
- atomic layer method 11 Treffer
- dielectrico alta constante dielectrica 11 Treffer
- dielectrique permittivite elevee 11 Treffer
- high k dielectric 11 Treffer
- methode couche atomique 11 Treffer
- metodo capa atomica 11 Treffer
- pastilla electronica 11 Treffer
- pastille electronique 11 Treffer
- wafer 11 Treffer
- corriente escape 9 Treffer
- courant fuite 9 Treffer
- evaluacion prestacion 9 Treffer
- evaluation performance 9 Treffer
- leakage current 9 Treffer
- performance evaluation 9 Treffer
- pmos technology 9 Treffer
- rapid thermal annealing 9 Treffer
- rapid thermal processing 9 Treffer
- recocido termico rapido 9 Treffer
- recuit thermique rapide 9 Treffer
- technologie pmos 9 Treffer
- tecnologia pmos 9 Treffer
- traitement thermique rapide 9 Treffer
- mosfet 8 Treffer
- transistor mosfet 8 Treffer
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58 Treffer
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 207-216KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 459-464KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 287-292KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 361-366KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 177-182KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 375-384KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 191-196KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 99-104KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 281-285KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 145-151KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 131-136KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 17-24KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 167-176KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 451-457KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 315-324KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 405-416KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 251-264KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 417-422KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 83-92KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 111-116KonferenzZugriff: