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Pushing the Lithography Limit : Applying Inverse Lithography Technology (ILT) at the 65nm GenerationIn: Optical microlithography XIX (21-24 February 2006, San Jose, California, USA), 2006KonferenzZugriff:
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In: Optical microlithography XIX (21-24 February 2006, San Jose, California, USA), 2006KonferenzZugriff:
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In: Optical microlithography XIX (21-24 February 2006, San Jose, California, USA), 2006KonferenzZugriff: