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Weniger Treffer
Gefunden in
Schlagwort
- circuits integres 156 Treffer
- integrated circuits 156 Treffer
- conception. technologies. analyse fonctionnement. essais 153 Treffer
- design. technologies. operation analysis. testing 153 Treffer
- complementary mos technology 143 Treffer
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45 weitere Werte:
- technologie mos complementaire 143 Treffer
- tecnologia mos complementario 143 Treffer
- transistors 100 Treffer
- fabricacion microelectrica 85 Treffer
- fabrication microelectronique 85 Treffer
- fabrication microelectronique (technologie des materiaux et des surfaces) 85 Treffer
- microelectronic fabrication 85 Treffer
- microelectronic fabrication (materials and surfaces technology) 85 Treffer
- evaluacion prestacion 66 Treffer
- evaluation performance 66 Treffer
- performance evaluation 66 Treffer
- dielectrico alta constante dielectrica 52 Treffer
- dielectrique permittivite elevee 52 Treffer
- high k dielectric 52 Treffer
- annealing 49 Treffer
- mosfet 49 Treffer
- recocido 49 Treffer
- recuit 49 Treffer
- transistor mosfet 49 Treffer
- silicon on insulator technology 47 Treffer
- technologie silicium sur isolant 47 Treffer
- tecnologia silicio sobre aislante 47 Treffer
- pastilla electronica 40 Treffer
- pastille electronique 40 Treffer
- policristal 40 Treffer
- polycristal 40 Treffer
- polycrystal 40 Treffer
- wafer 40 Treffer
- caracteristica electrica 39 Treffer
- caracteristique electrique 39 Treffer
- electrical characteristic 39 Treffer
- grille transistor 37 Treffer
- rejilla transistor 37 Treffer
- transistor gate 37 Treffer
- corriente escape 35 Treffer
- courant fuite 35 Treffer
- leakage current 35 Treffer
- miniaturisation 34 Treffer
- miniaturizacion 34 Treffer
- miniaturization 34 Treffer
- circuit integre 33 Treffer
- circuito integrado 33 Treffer
- integrated circuit 33 Treffer
- capa fina 30 Treffer
- couche mince 30 Treffer
Publikation
- advanced gate stack, source/drain and channel engineering for si-based cmos : naw materials, processes, and equipment (quebec pq, 16-18 may 2005) 72 Treffer
- advanced short-time thermal processing for si-based cmos devices (paris, 27 april - 2 may 2003) 58 Treffer
- advanced short-time thermal processing for si-based cmos devices ii (san antonio tx, 10-12 may 2004) 44 Treffer
- ulsi process integration iii (paris, 28 april - 2 may 2003) 16 Treffer
- silicon-on-insulator technology and devices xi (paris, 28 april - 2 may 2003) 15 Treffer
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15 weitere Werte:
- dielectrics for nanosystems : materials science, processing, reliability, and manufacturing (honolulu hi, 3-8 october 2004) 13 Treffer
- ulsi process integration iv (quebec pq, 16-20 may 2005) 13 Treffer
- silicon-on-insulator technology and devices xii (quebec pq, 15-20 may 2005) 10 Treffer
- silicon materials science and technology x (denver co, 7-12 may 2006) 7 Treffer
- microelectronics technology and devices sbmicro 2004 (porto de galinhas beach, 2004) 5 Treffer
- semiconductor wafer bonding viii : science, technology, and applications (quebec pq, 15-20 may 2005) 5 Treffer
- dielectrics for nanosystems ii (materials science, processing, reliability, and manufacturing) 4 Treffer
- high purity silicon viii (honolulu hi, 3-8 october 2004) 3 Treffer
- microelectronics technology and devices sbmicro 2003 (sao paulo, 8-11 september 2003) 3 Treffer
- silicon nitride and silicon dioxide thin insulating films vii (paris, 28 april - 2 may 2003) 3 Treffer
- dielectrics in emerging technologies (paris, 27 april - 2 may 2003) 2 Treffer
- low temperature electronics and low temperaturee cofired ceramic based electronic devices (orlando fl, 12-16 october 2003) 2 Treffer
- semiconductor wafer bonding vii : science, technology, and applications (paris, april - may 2003) 2 Treffer
- electrochemical processing in ulsi fabrication i and interconnect and contact metallization : materials, processes, and reliability (san diego ca, 4-5 may 1998) 1 Treffer
- magnetic materials, processes, and devices : applications to storage and microelectromechanical systems (mems) (boston ma, 1-6 november 1998) 1 Treffer
Sprache
279 Treffer
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 207-216KonferenzZugriff:
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In: Dielectrics for nanosystems : materials science, processing, reliability, and manufacturing (Honolulu HI, 3-8 October 2004), 2004, S. 292-311KonferenzZugriff:
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In: Low temperature electronics and low temperaturee cofired ceramic based electronic devices (Orlando FL, 12-16 October 2003), 2003, S. 44-49KonferenzZugriff:
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In: Microelectronics technology and devices SBMICRO 2003 (Sao Paulo, 8-11 September 2003), 2003, S. 428-436KonferenzZugriff:
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Novel dielectric structures for optical performance enhancement in deep sub-micron CMOS image sensorIn: Dielectrics for nanosystems : materials science, processing, reliability, and manufacturing (Honolulu HI, 3-8 October 2004), 2004, S. 135-150KonferenzZugriff:
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In: ULSI process integration III (Paris, 28 April - 2 May 2003), 2003, S. 330-345KonferenzZugriff:
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In: Advanced gate stack, source/drain and channel engineering for Si-based CMOS : naw materials, processes, 2005, S. 301-310KonferenzZugriff:
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In: Advanced gate stack, source/drain and channel engineering for Si-based CMOS : naw materials, processes, 2005, S. 13-22KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices (Paris, 27 April - 2 May 2003), 2003, S. 459-464KonferenzZugriff:
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In: Silicon materials science and technology X (Denver CO, 7-12 May 2006), 2006, S. 27-31KonferenzZugriff:
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In: Advanced gate stack, source/drain and channel engineering for Si-based CMOS : naw materials, processes, 2005, S. 535-541KonferenzZugriff:
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In: Advanced gate stack, source/drain and channel engineering for Si-based CMOS : naw materials, processes, 2005, S. 233-240KonferenzZugriff:
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In: Advanced gate stack, source/drain and channel engineering for Si-based CMOS : naw materials, processes, 2005, S. 188-197KonferenzZugriff:
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In: ULSI process integration IV (Quebec PQ, 16-20 May 2005), 2005, S. 306-315KonferenzZugriff:
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In: Advanced gate stack, source/drain and channel engineering for Si-based CMOS : naw materials, processes, 2005, S. 293-300KonferenzZugriff:
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In: Advanced gate stack, source/drain and channel engineering for Si-based CMOS : naw materials, processes, 2005, S. 3-12KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices II (San Antonio TX, 10-12 May 2004), 2004, S. 191-201KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices II (San Antonio TX, 10-12 May 2004), 2004, S. 159-173KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices II (San Antonio TX, 10-12 May 2004), 2004, S. 341-353KonferenzZugriff:
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In: Advanced short-time thermal processing for Si-based CMOS devices II (San Antonio TX, 10-12 May 2004), 2004, S. 313-320KonferenzZugriff: