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Weniger Treffer
Gefunden in
Art der Quelle
Schlagwort
- materials science 505 Treffer
- business 433 Treffer
- business.industry 433 Treffer
- lithography 413 Treffer
- optics 320 Treffer
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45 weitere Werte:
- law 294 Treffer
- law.invention 294 Treffer
- photoresist 246 Treffer
- photolithography 242 Treffer
- optoelectronics 221 Treffer
- chemistry 208 Treffer
- nanotechnology 163 Treffer
- wafer 124 Treffer
- chemistry.chemical_compound 97 Treffer
- chemistry.chemical_classification 96 Treffer
- extreme ultraviolet lithography 89 Treffer
- polymer 86 Treffer
- engineering 84 Treffer
- photomask 84 Treffer
- condensed matter physics 79 Treffer
- electrical and electronic engineering 79 Treffer
- etching (microfabrication) 74 Treffer
- electron-beam lithography 73 Treffer
- atomic and molecular physics, and optics 72 Treffer
- electronic, optical and magnetic materials 72 Treffer
- surfaces, coatings and films 67 Treffer
- chemistry.chemical_element 63 Treffer
- analytical chemistry 53 Treffer
- critical dimension 53 Treffer
- medicine 53 Treffer
- stepper 49 Treffer
- applied sciences 48 Treffer
- electronics 48 Treffer
- electronique 48 Treffer
- exact sciences and technology 48 Treffer
- sciences appliquees 48 Treffer
- sciences exactes et technologie 48 Treffer
- electronique des semiconducteurs. microelectronique. optoelectronique. dispositifs a l'etat solide 47 Treffer
- resistencia 47 Treffer
- semiconductor electronics. microelectronics. optoelectronics. solid state devices 47 Treffer
- fabrication microelectronique (technologie des materiaux et des surfaces) 46 Treffer
- microelectronic fabrication (materials and surfaces technology) 46 Treffer
- organic chemistry 45 Treffer
- next-generation lithography 44 Treffer
- fabrication 43 Treffer
- reticle 43 Treffer
- layer (electronics) 42 Treffer
- physics 42 Treffer
- silicon 42 Treffer
- dissolution 40 Treffer
Verlag
- spie 451 Treffer
- elsevier bv 64 Treffer
- technical association of photopolymers, japan 32 Treffer
- ieee 25 Treffer
- american vacuum society 19 Treffer
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36 weitere Werte:
- springer science and business media llc 12 Treffer
- elsevier science 11 Treffer
- iop publishing 10 Treffer
- elsevier 5 Treffer
- spie-intl soc optical eng 5 Treffer
- japan soc. appl. phys 4 Treffer
- the electrochemical society 3 Treffer
- the society of photopolymer science and technology(spst) 3 Treffer
- wiley 3 Treffer
- american chemical society (acs) 2 Treffer
- hal ccsd 2 Treffer
- institute of electrical and electronics engineers (ieee) 2 Treffer
- institution of engineering and technology (iet) 2 Treffer
- spie press 2 Treffer
- trans tech publications, ltd. 2 Treffer
- aip publishing 1 Treffer
- american chemical society 1 Treffer
- american scientific publishers 1 Treffer
- arxiv 1 Treffer
- canadian science publishing 1 Treffer
- ibm 1 Treffer
- intech 1 Treffer
- japan society of applied physics 1 Treffer
- japanese journal of applied physics 1 Treffer
- osa 1 Treffer
- pleiades publishing ltd 1 Treffer
- published by elsevier b.v. 1 Treffer
- royal soc chemistry 1 Treffer
- royal society of chemistry (rsc) 1 Treffer
- spie, the international society for optical engineering, bellingham, wa 1 Treffer
- spie-int soc optical engineering 1 Treffer
- springer vienna 1 Treffer
- technical assoc photopolymers,japan 1 Treffer
- the optical society 1 Treffer
- vsb-technical university of ostrava 1 Treffer
- widerkehr & associates 1 Treffer
Publikation
- spie proceedings 309 Treffer
- microelectronic engineering 72 Treffer
- journal of photopolymer science and technology 36 Treffer
- spie proceedings series 26 Treffer
- advances in resist technology and processing xiv 19 Treffer
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45 weitere Werte:
- advances in resist technology and processing xvii 19 Treffer
- journal of vacuum science & technology b: microelectronics and nanometer structures 17 Treffer
- mrs proceedings 11 Treffer
- advances in resist technology and processing xx 9 Treffer
- japanese journal of applied physics 9 Treffer
- proceedings of spie, the international society for optical engineering 9 Treffer
- advances in resist technology and processing xi 6 Treffer
- advances in resist technology and processing x 5 Treffer
- advances in resist technology and processing xviii (santa clara ca, 26-28 february 2001) 5 Treffer
- optical microlithography xiv (santa clara ca, 27 february - 2 march 2001) 5 Treffer
- micro- and nano- engineering 98, mne. proceedings of the international conference on micro- and nanofabrication, september 22-24 1998, leuven, belgium 4 Treffer
- advances in resist technology and processing viii 3 Treffer
- journal of micro/nanolithography, mems, and moems 3 Treffer
- metrology, inspection, and process control for microlithography xiv (santa clara ca, 28 february - 2 march 2000) 3 Treffer
- 10th annual ieee/semi. advanced semiconductor manufacturing conference and workshop. asmc 99 proceedings (cat. no.99ch36295) 2 Treffer
- 24th annual bacus symposium on photomask technology (monterey ca, 14-17 october 2004) 2 Treffer
- advanced materials interfaces 2 Treffer
- advances in resist materials and processing technology xxvi 2 Treffer
- advances in resist technology and processing iii 2 Treffer
- advances in resist technology and processing xxii (san jose ca, 28 february - 2 march 2005) 2 Treffer
- digest of papers microprocesses and nanotechnology 2000. 2000 international microprocesses and nanotechnology conference (ieee cat. no.00ex387) 2 Treffer
- digest of papers. microprocesses and nanotechnology'98. 198 international microprocesses and nanotechnology conference (cat. no.98ex135) 2 Treffer
- emerging lithographic technologies xi (27 february- 1 march 2007, san jose, california, usa) 2 Treffer
- micro- and nano- engineering 2001, mne: proceedings of the 27th international conference on micro- and nano-engineering, september 16-19, 2001, grenoble, france 2 Treffer
- micro- and nano-engineering 99: mne 99 2 Treffer
- optical microlithography xi (santa clara ca, 25-27 february 1998) 2 Treffer
- photomask technology 2006 (19-22 september, 2006, monterey, california, usa) 2 Treffer
- proceedings of spie - the international society for optical engineering 2 Treffer
- 0annual bacus symposium on photomask technology 1 Treffer
- 19th annual symposium on photomask technology (monterey ca, 15-17 september 1999) 1 Treffer
- 20th european conference on mask technology for integrated circuits and microcomponents (dresden, 12-14 january 2004) 1 Treffer
- 25th annual bacus symposium on photomask technology (4-7 october, 2006, monterey, california, usa) 1 Treffer
- advances in resist technology and processing xxiii (20-22 february 2006, san jose, california, usa) 1 Treffer
- data analysis and modeling for process control ii (san jose ca, 3-4 march 2005) 1 Treffer
- journal of materials chemistry c 1 Treffer
- light-emitting diodes (research, manufacturing, and applications xi) 1 Treffer
- lithography for semiconductor manufacturing (edinburgh, 19-21 may 1999) 1 Treffer
- metrology, inspection, and process control for microlithography xv (santa clara ca, 26 february - 1 march 2001 ) 1 Treffer
- metrology, inspection, and process control for microlithography xx (20-23 february 2006, san jose, california, usa) 1 Treffer
- micro- and nano-engineering 2000 mne. proceedings of the 26th international conference on micro- and nano-engineering, september 18-21, 2000 1 Treffer
- optical microlithography xix (21-24 february 2006, san jose, california, usa) 1 Treffer
- photomask and next-generation lithography mask technology viii (yokohama, 25-27 april 2001) 1 Treffer
- photomask and next-generation lithography mask technology xii (13-15 april 2005, yokohama, japan) 1 Treffer
- proceedings of the 31st international conference on micro- and nano-engineering: 19-22 september 2005, vienna, austria 1 Treffer
- process, equipment, and materials control in integrated circuit manufacturing v (santa clara ca, 22-23 september 1999) 1 Treffer
Sprache
690 Treffer
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In: Micro- and Nano- Engineering 98, MNE. Proceedings of the International Conference on Micro- and Nanofabrication, September 22-24 1998, Leuven, Belgium, Jg. 46 (1999), Heft 1-4, S. 173-177KonferenzZugriff:
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In: 20th European conference on mask technology for integrated circuits and microcomponents (Dresden, 12-14 January 2004), 2004, S. 19-25KonferenzZugriff:
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In: Optical microlithography XIV (Santa Clara CA, 27 February - 2 March 2001), 2001, S. 936-944KonferenzZugriff:
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In: Advances in resist technology and processing XVIII (Santa Clara CA, 26-28 February 2001), 2001, S. 601-609KonferenzZugriff:
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In: 24th annual BACUS symposium on photomask technology (Monterey CA, 14-17 October 2004), 2004, S. 234-244KonferenzZugriff:
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In: Micro and Nano Engineering, Jg. 13 (2021-11-01)Online unknownZugriff:
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In: 19th annual symposium on photomask technology (Monterey CA, 15-17 September 1999), 1999, S. 865-874KonferenzZugriff:
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In: Micro- and Nano- Engineering 98, MNE. Proceedings of the International Conference on Micro- and Nanofabrication, September 22-24 1998, Leuven, Belgium, Jg. 46 (1999), Heft 1-4, S. 389-392KonferenzZugriff:
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In: Advances in resist technology and processing XVIII (Santa Clara CA, 26-28 February 2001), 2001, S. 528-535KonferenzZugriff:
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In: Micro- and Nano-Engineering 99: MNE 99, Jg. 53 (2000), Heft 1-4, S. 443-447KonferenzZugriff:
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In: Process, equipment, and materials control in integrated circuit manufacturing V (Santa Clara CA, 22-23 September 1999), 1999, S. 45-54KonferenzZugriff:
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In: Micro- and Nano- Engineering 98, MNE. Proceedings of the International Conference on Micro- and Nanofabrication, September 22-24 1998, Leuven, Belgium, Jg. 46 (1999), Heft 1-4, S. 383-387KonferenzZugriff:
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In: Photomask and next-generation lithography mask technology VIII (Yokohama, 25-27 April 2001), 2001, S. 306-311KonferenzZugriff:
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In: Advances in resist technology and processing XVIII (Santa Clara CA, 26-28 February 2001), 2001, S. 618-627KonferenzZugriff:
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In: Nanotechnology, Jg. 32 (2021-01-19), Heft 23Online unknownZugriff:
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Dieser Titel kann aus lizenzrechtlichen Gründen nur im Campusnetz oder nach Anmeldung angezeigt werden!academicJournalZugriff:
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In: Photomask and next-generation lithography mask technology XII (13-15 April 2005, Yokohama, Japan), 2006KonferenzZugriff:
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In: Metrology, inspection, and process control for microlithography XX (20-23 February 2006, San Jose, California, USA), 2006KonferenzZugriff:
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In: Advances in resist technology and processing XXII (San Jose CA, 28 February - 2 March 2005), 2005KonferenzZugriff:
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In: 25th annual BACUS symposium on photomask technology (4-7 October, 2006, Monterey, California, USA), 2005KonferenzZugriff: