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Weniger Treffer
Gefunden in
Art der Quelle
Schlagwort
- lithography 34 Treffer
- business 26 Treffer
- business.industry 26 Treffer
- computer science 24 Treffer
- optics 21 Treffer
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45 weitere Werte:
- hardware_integratedcircuits 12 Treffer
- process (computing) 12 Treffer
- optical proximity correction 11 Treffer
- electronic engineering 10 Treffer
- engineering 10 Treffer
- law 10 Treffer
- law.invention 10 Treffer
- process window 10 Treffer
- electronics 9 Treffer
- node (circuits) 9 Treffer
- photolithography 9 Treffer
- photomask 9 Treffer
- applied sciences 8 Treffer
- electronique 8 Treffer
- exact sciences and technology 8 Treffer
- extreme ultraviolet lithography 8 Treffer
- pastilla electronica 8 Treffer
- pastille electronique 8 Treffer
- physics 8 Treffer
- physique 8 Treffer
- sciences appliquees 8 Treffer
- sciences exactes et technologie 8 Treffer
- 02 engineering and technology 7 Treffer
- artificial intelligence 7 Treffer
- electronique des semiconducteurs. microelectronique. optoelectronique. dispositifs a l'etat solide 7 Treffer
- fabricacion microelectrica 7 Treffer
- fabrication microelectronique 7 Treffer
- fabrication microelectronique (technologie des materiaux et des surfaces) 7 Treffer
- lithographie 7 Treffer
- litografia 7 Treffer
- microelectronic fabrication 7 Treffer
- microelectronic fabrication (materials and surfaces technology) 7 Treffer
- optique 7 Treffer
- semiconductor electronics. microelectronics. optoelectronics. solid state devices 7 Treffer
- 01 natural sciences 6 Treffer
- 0103 physical sciences 6 Treffer
- 0210 nano-technology 6 Treffer
- 021001 nanoscience & nanotechnology 6 Treffer
- curvilinear coordinates 6 Treffer
- 010309 optics 5 Treffer
- circuits integres 5 Treffer
- conception. technologies. analyse fonctionnement. essais 5 Treffer
- design for manufacturability 5 Treffer
- design. technologies. operation analysis. testing 5 Treffer
- integrated circuit 5 Treffer
Verlag
Publikation
- spie proceedings 20 Treffer
- 0annual bacus symposium on photomask technology 3 Treffer
- 25th annual bacus symposium on photomask technology (4-7 october, 2006, monterey, california, usa) 3 Treffer
- proceedings of spie, the international society for optical engineering 3 Treffer
- microelectronic engineering 2 Treffer
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16 weitere Werte:
- optical microlithography xix (21-24 february 2006, san jose, california, usa) 2 Treffer
- photomask technology 2021 2 Treffer
- 2003 8th international symposium plasma- and process-induced damage. 1 Treffer
- 2009 international conference on simulation of semiconductor processes and devices 1 Treffer
- 2021 china semiconductor technology international conference (cstic) 1 Treffer
- design-process-technology co-optimization for manufacturability xiv 1 Treffer
- extreme ultraviolet (euv) lithography vii 1 Treffer
- international symposium on microelectronics 1 Treffer
- mems design, fabrication, characterization, and packaging (edinburgh, 30 may - 1 june 2001) 1 Treffer
- novel patterning technologies 2021 1 Treffer
- optical microlithography xxi 1 Treffer
- optics express 1 Treffer
- photomask and next-generation lithography mask technology xiii (18-20 april, 2006, yokohama, japan) 1 Treffer
- photomask technology 2020 1 Treffer
- proceedings of spie-the international society for optical engineering 1 Treffer
- spie proceedings series 1 Treffer
Sprache
46 Treffer
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In: 2021 China Semiconductor Technology International Conference (CSTIC), 2021-03-14Online unknownZugriff:
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Pushing the Lithography Limit : Applying Inverse Lithography Technology (ILT) at the 65nm GenerationIn: Optical microlithography XIX (21-24 February 2006, San Jose, California, USA), 2006KonferenzZugriff:
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In: Photomask and next-generation lithography mask technology XIII (18-20 April, 2006, Yokohama, Japan), 2006KonferenzZugriff:
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In: 25th annual BACUS symposium on photomask technology (4-7 October, 2006, Monterey, California, USA), 2005KonferenzZugriff:
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In: 25th annual BACUS symposium on photomask technology (4-7 October, 2006, Monterey, California, USA), 2005KonferenzZugriff:
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In: 25th annual BACUS symposium on photomask technology (4-7 October, 2006, Monterey, California, USA), 2005KonferenzZugriff:
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In: Photomask Technology 2020, 2020-10-07Online unknownZugriff:
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In: Optical microlithography XIX (21-24 February 2006, San Jose, California, USA), 2006KonferenzZugriff:
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In: SPIE Proceedings, 2017-03-24Online unknownZugriff:
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In: SPIE Proceedings, 2016-05-10Online unknownZugriff:
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In: SPIE Proceedings, 2015-03-18Online unknownZugriff:
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In: SPIE Proceedings, 2011-03-17Online unknownZugriff:
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In: Optical Microlithography XXI, 2008-03-14Online unknownZugriff:
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In: SPIE Proceedings, 2005-10-21Online unknownZugriff:
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In: SPIE Proceedings, 2006-03-10Online unknownZugriff:
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In: Microelectronic engineering, Jg. 87 (2010), Heft 4, S. 560-565academicJournalZugriff:
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In: Design-Process-Technology Co-optimization for Manufacturability XIV, 2020-03-26Online unknownZugriff:
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In: Design-Process-Technology Co-optimization for Manufacturability XIV, 2020-03-23Online unknownZugriff:
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In: Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 2019-06-27Online unknownZugriff:
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In: Optics Express, Jg. 28 (2020-06-24), S. 20404-20404Online unknownZugriff: