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Weniger Treffer
Gefunden in
Art der Quelle
Schlagwort
- lithography 138 Treffer
- business 137 Treffer
- business.industry 137 Treffer
- computer science 103 Treffer
- optics 77 Treffer
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45 weitere Werte:
- ilt 68 Treffer
- law 67 Treffer
- law.invention 67 Treffer
- optical proximity correction 66 Treffer
- hardware_integratedcircuits 59 Treffer
- engineering 57 Treffer
- electronic engineering 55 Treffer
- photomask 48 Treffer
- process window 48 Treffer
- process (computing) 44 Treffer
- photolithography 39 Treffer
- wafer 38 Treffer
- opc 37 Treffer
- physics 37 Treffer
- node (circuits) 34 Treffer
- computational lithography 33 Treffer
- electronics 33 Treffer
- electronique 31 Treffer
- extreme ultraviolet lithography 31 Treffer
- optique 31 Treffer
- physique 31 Treffer
- design for manufacturability 29 Treffer
- exact sciences and technology 29 Treffer
- sciences exactes et technologie 29 Treffer
- algorithm 28 Treffer
- artificial intelligence 25 Treffer
- applied sciences 24 Treffer
- laser 24 Treffer
- sciences appliquees 24 Treffer
- machine learning 21 Treffer
- materials science 21 Treffer
- chip 19 Treffer
- computer engineering 19 Treffer
- simulation 19 Treffer
- 02 engineering and technology 17 Treffer
- curvilinear coordinates 17 Treffer
- engineering drawing 17 Treffer
- lidar 17 Treffer
- multiple patterning 17 Treffer
- telecommunications 17 Treffer
- computer 16 Treffer
- electronique des semiconducteurs. microelectronique. optoelectronique. dispositifs a l'etat solide 16 Treffer
- feature (computer vision) 16 Treffer
- resist 16 Treffer
- semiconductor electronics. microelectronics. optoelectronics. solid state devices 16 Treffer
Publikation
- proceedings of spie - the international society for optical engineering 195 Treffer
- spie proceedings 120 Treffer
- proceedings of spie, the international society for optical engineering 20 Treffer
- spie proceedings series 17 Treffer
- photomask technology 2021 7 Treffer
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45 weitere Werte:
- 0annual bacus symposium on photomask technology 6 Treffer
- 25th annual bacus symposium on photomask technology (4-7 october, 2006, monterey, california, usa) 6 Treffer
- international conference on space optics - icso 2021 ; https://insu.hal.science/insu-03463977 ; international conference on space optics - icso 2021, mar 2021, online only, united states. pp.118521u, ⟨10.1117/12.2599326⟩ 6 Treffer
- photomask technology 2019 6 Treffer
- proceedings- spie the international society for optical engineering 6 Treffer
- optical microlithography xxxi 5 Treffer
- optical microlithography xxxiv 5 Treffer
- design-process-technology co-optimization xv 4 Treffer
- dtco and computational patterning iii 4 Treffer
- optical microlithography xxxiii 4 Treffer
- photomask technology 2018 4 Treffer
- remote sensing of clouds and the atmosphere xxvii. proceedings spie vol pc12265 ; https://insu.hal.science/insu-04252966 ; remote sensing of clouds and the atmosphere xxvii. proceedings spie vol pc12265, sep 2022, berlin, germany. ⟨10.1117/12.2636197⟩ 4 Treffer
- optical microlithography xix (21-24 february 2006, san jose, california, usa) 3 Treffer
- photomask technology 2020 3 Treffer
- photon processing in microelectronics and photonics ii (san jose ca, 27-30 january 2003) 3 Treffer
- spie proceedings ; 25th annual bacus symposium on photomask technology ; issn 0277-786x 3 Treffer
- design-process-technology co-optimization for manufacturability xiii 2 Treffer
- dtco and computational patterning 2 Treffer
- optical and euv nanolithography xxxv 2 Treffer
- photomask technology 2022 2 Treffer
- spie proceedings ; optical microlithography xix ; issn 0277-786x 2 Treffer
- spie proceedings ; optical microlithography xxiii ; issn 0277-786x 2 Treffer
- spie proceedings ; optical microlithography xxiv ; issn 0277-786x 2 Treffer
- spie proceedings ; photomask technology 2010 ; issn 0277-786x 2 Treffer
- 27th european mask and lithography conference ; spie proceedings ; issn 0277-786x 1 Treffer
- 33rd european mask and lithography conference 1 Treffer
- optical microlithography xxi ; spie proceedings ; issn 0277-786x 1 Treffer
- photomask japan 2015: photomask and next-generation lithography mask technology xxii ; spie proceedings ; issn 0277-786x 1 Treffer
- photomask technology 2008 ; spie proceedings ; issn 0277-786x 1 Treffer
- spie proceedings ; biomedical sensing, imaging, and tracking technologies ii ; issn 0277-786x 1 Treffer
- spie proceedings ; design for manufacturability through design-process integration v ; issn 0277-786x 1 Treffer
- spie proceedings ; design-process-technology co-optimization for manufacturability ix ; issn 0277-786x 1 Treffer
- spie proceedings ; design-process-technology co-optimization for manufacturability x ; issn 0277-786x 1 Treffer
- spie proceedings ; lithography asia 2009 ; issn 0277-786x 1 Treffer
- spie proceedings ; optical microlithography xx ; issn 0277-786x 1 Treffer
- spie proceedings ; optical microlithography xxii ; issn 0277-786x 1 Treffer
- spie proceedings ; optical microlithography xxvii ; issn 0277-786x 1 Treffer
- spie proceedings ; optical microlithography xxviii ; issn 0277-786x 1 Treffer
- spie proceedings ; optical microlithography xxx ; issn 0277-786x 1 Treffer
- spie proceedings ; photomask and next-generation lithography mask technology xiii ; issn 0277-786x 1 Treffer
- spie proceedings ; photomask and next-generation lithography mask technology xiv ; issn 0277-786x 1 Treffer
- spie proceedings ; photomask and next-generation lithography mask technology xxi ; issn 0277-786x 1 Treffer
- spie proceedings ; photomask japan 2016: xxiii symposium on photomask and next-generation lithography mask technology ; issn 0277-786x 1 Treffer
- spie proceedings ; photomask japan 2017: xxiv symposium on photomask and next-generation lithography mask technology ; issn 0277-786x 1 Treffer
- spie proceedings ; photomask technology 2007 ; issn 0277-786x 1 Treffer
Sprache
Geographischer Bezug
527 Treffer
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In: DTCO and Computational Patterning, 2022-06-13Online unknownZugriff:
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In: Optical and EUV Nanolithography XXXV, 2022-06-13Online unknownZugriff:
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In: Photomask Technology 2021, 2021-11-08Online unknownZugriff:
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In: Design-Process-Technology Co-optimization XV, 2021-04-13Online unknownZugriff:
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In: Optical Microlithography XXXIV, 2021-03-22Online unknownZugriff:
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In: Optical Microlithography XXXIV, 2021-02-22Online unknownZugriff:
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Pushing the Lithography Limit : Applying Inverse Lithography Technology (ILT) at the 65nm GenerationIn: Optical microlithography XIX (21-24 February 2006, San Jose, California, USA), 2006KonferenzZugriff:
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In: Photomask and next-generation lithography mask technology XIII (18-20 April, 2006, Yokohama, Japan), 2006KonferenzZugriff:
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In: 25th annual BACUS symposium on photomask technology (4-7 October, 2006, Monterey, California, USA), 2005KonferenzZugriff:
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In: 25th annual BACUS symposium on photomask technology (4-7 October, 2006, Monterey, California, USA), 2005KonferenzZugriff:
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In: 25th annual BACUS symposium on photomask technology (4-7 October, 2006, Monterey, California, USA), 2005KonferenzZugriff:
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In: Optical Microlithography XXXIII, 2020-03-31Online unknownZugriff:
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In: Photomask Technology 2020, 2020-10-07Online unknownZugriff:
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In: Optical microlithography XIX (21-24 February 2006, San Jose, California, USA), 2006KonferenzZugriff:
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In: Optical Microlithography XXXIV, 2021-02-22Online unknownZugriff:
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In: Optical Microlithography XXXIII, 2020-03-23Online unknownZugriff:
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In: Optical Microlithography XXXIII, 2020-03-23Online unknownZugriff:
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In: Photomask Technology 2019, 2019-10-10Online unknownZugriff:
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In: Photomask Technology 2019, 2019-10-03Online unknownZugriff:
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In: Optical Microlithography XXXIII, 2020-03-25Online unknownZugriff: