Electrical Properties of Metal-Induced Laterally Crystallized p-Type LTPS-TFT With High- $\kappa $ ZrTiO4 Gate Dielectric Featuring Low Equivalent-Oxide-Thickness.
In: IEEE Transactions on Electron Devices, Jg. 63 (2016-06-01), Heft 6, S. 2391-2397
Online
academicJournal
Zugriff:
Titel: |
Electrical Properties of Metal-Induced Laterally Crystallized p-Type LTPS-TFT With High- $\kappa $ ZrTiO4 Gate Dielectric Featuring Low Equivalent-Oxide-Thickness.
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Autor/in / Beteiligte Person: | Park, Jae Hyo ; Han, Ji Su ; Joo, Seung Ki |
Link: | |
Zeitschrift: | IEEE Transactions on Electron Devices, Jg. 63 (2016-06-01), Heft 6, S. 2391-2397 |
Veröffentlichung: | 2016 |
Medientyp: | academicJournal |
ISSN: | 0018-9383 (print) |
DOI: | 10.1109/TED.2016.2544862 |
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