Chemical vapor deposition: a potential tool for wafer scale growth of two-dimensional layered materials.
In: Journal of Physics D: Applied Physics, Jg. 55 (2022-11-24), Heft 47, S. 1-18
academicJournal
Zugriff:
Titel: |
Chemical vapor deposition: a potential tool for wafer scale growth of two-dimensional layered materials.
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Autor/in / Beteiligte Person: | El Hammoumi, Mohammed ; Chaudhary, Vivek ; Neugebauer, P ; El Fatimy, A |
Link: | |
Zeitschrift: | Journal of Physics D: Applied Physics, Jg. 55 (2022-11-24), Heft 47, S. 1-18 |
Veröffentlichung: | 2022 |
Medientyp: | academicJournal |
ISSN: | 0022-3727 (print) |
DOI: | 10.1088/1361-6463/ac928d |
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