Low temperature sputtering deposition of Al1−xScxN thin films: Physical, chemical, and piezoelectric properties evolution by tuning the nitrogen flux in (Ar + N2) reactive atmosphere.
In: Journal of Applied Physics, Jg. 135 (2024-03-28), Heft 12, S. 1-11
academicJournal
Zugriff:
Titel: |
Low temperature sputtering deposition of Al1−xScxN thin films: Physical, chemical, and piezoelectric properties evolution by tuning the nitrogen flux in (Ar + N2) reactive atmosphere.
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Autor/in / Beteiligte Person: | Signore, M. A. ; Serra, A. ; Manno, D. ; Quarta, G. ; Calcagnile, L. ; Maruccio, L. ; Sciurti, E. ; Melissano, E. ; Campa, A. ; Martucci, M. C. ; Francioso, L. ; Velardi, L. |
Zeitschrift: | Journal of Applied Physics, Jg. 135 (2024-03-28), Heft 12, S. 1-11 |
Veröffentlichung: | 2024 |
Medientyp: | academicJournal |
ISSN: | 0021-8979 (print) |
DOI: | 10.1063/5.0202683 |
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