Printing Beyond sRGB Color Gamut by Mimicking Silicon Nanostructures in Free-Space.
In: Nano Letters, Jg. 17 (2017-12-13), Heft 12, S. 7620-7628
academicJournal
Zugriff:
Localized optical resonances in metallic nanostructures have been increasingly used in color printing, demonstrating unprecedented resolution but limited in color gamut. Here, we introduce a new nanostructure design, which broadens the gamut while retaining print resolution. Instead of metals, silicon nanostructures that exhibit localized magnetic and electric dipole resonances were fabricated on a silicon substrate coated with a Si3N4 index matching layer. Index matching allows a suppression of substrate effects, thus enabling Kerker's conditions to be met, that is, sharpened transitions in the reflectance spectra leading to saturated colors. This nanostructure design achieves a color gamut superior to sRGB, and is compatible with CMOS processes. The presented design could enable compact high-resolution color displays and filters, and the use of a Si3N4 antireflection coating can be readily extended to designs with nanostructures fabricated using other high-index materials. [ABSTRACT FROM AUTHOR]
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Printing Beyond sRGB Color Gamut by Mimicking Silicon Nanostructures in Free-Space.
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Autor/in / Beteiligte Person: | Dong, Zhaogang ; Ho, Jinfa ; Ye Feng Yu ; Yuan Hsing Fu ; Paniagua-Dominguez, Ramón ; Wang, Sihao ; Kuznetsov, Arseniy I. ; Yang, Joel K. W. |
Zeitschrift: | Nano Letters, Jg. 17 (2017-12-13), Heft 12, S. 7620-7628 |
Veröffentlichung: | 2017 |
Medientyp: | academicJournal |
ISSN: | 1530-6984 (print) |
DOI: | 10.1021/acs.nanolett.7b03613 |
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