PREPARATION AND CHARACTERIZATIONS OF PbZr 0.53 Ti 0.47 O 3 THICK FILMS ON LaNiO 3 COATED Si BY MODIFIED METALLORGANIC DECOMPOSITION PROCESS.

The PbZr 0.53 Ti 0.47 O 3 (PZT) thick films have been deposited on LaNiO 3 (LNO) coated silicon substrate by modified metallorganic decomposition process. The X-ray diffraction measurements show the films exhibit a single perovskite phase with (110) preferred orientation. SEM measurements show the PZT thick films have a layer structure with grain size about 100 nm. The thickness dependence of ferroelectric, dielectric and piezoelectric properties were investigated. The post-annealing effects on the electrical and optical properties were investigated. The results show that this (110) oriented PZT thick films on LNO coated Si substrate are potential for integrated ferroelectric devices applications. [ABSTRACT FROM AUTHOR]