STRUCTURAL, MICRO STRUCTURAL AND ELECTRICAL PROPERTIES COMPARISON OF PZT FILMS DEPOSITED ON DIFFERENT BOTTOM ELECTRODES.
In: Integrated Ferroelectrics, Jg. 80 (2006-03-01), Heft 1, S. 237-243
academicJournal
Zugriff:
The crystalline quality and the electrical properties of Pb(Zr,Ti)O 3 (PZT) thin films deposited on LaNiO 3 and Pt/TiO x electrodes were compared to investigate their possibility of applications. The sputtered Pt electrodes were (111) preferentially oriented. The LNO were spin-coated and exhibited (100) orientation. The PZT films, grown by rf magnetron sputtering, presented different crystallographic orientation according to the nature of the bottom electrode: they were (111) and (100) respectively oriented. Concerning the electrical properties, the PZT films grown on Pt/TiO x have a larger permittivity. The maximum and remnant polarizations are larger for PZT on LNO, and the resistance to fatigue is also better. The electrical results obtained on different bottom electrodes are discussed. [ABSTRACT FROM AUTHOR]
Titel: |
STRUCTURAL, MICRO STRUCTURAL AND ELECTRICAL PROPERTIES COMPARISON OF PZT FILMS DEPOSITED ON DIFFERENT BOTTOM ELECTRODES.
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Autor/in / Beteiligte Person: | Soyer, C. ; Wang, G. ; Cattan, E. ; Rémiens, D. |
Zeitschrift: | Integrated Ferroelectrics, Jg. 80 (2006-03-01), Heft 1, S. 237-243 |
Veröffentlichung: | 2006 |
Medientyp: | academicJournal |
ISSN: | 1058-4587 (print) |
DOI: | 10.1080/10584580600659357 |
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