PREPARATION OF (100)- AND (110)-ORIENTED LaNiO<subscript>3</subscript> THIN FILMS BY CHEMICAL SOLUTION DEPOSITION.
In: Surface Review & Letters, Jg. 14 (2007-02-01), Heft 1, S. 123-128
academicJournal
Zugriff:
LaNiO3(LNO) thin films were prepared on Si(100) substrates by a chemical solution deposition method. The orientation of LNO films was controlled by changing the acetic acid amount, concentration of the precursor solutions and pre-annealing time. The highly (100)- and (110)-oriented LNO films were obtained by optimizing these processing conditions. The orientation factors of the optimized (100)- and (110)-oriented LNO films were more than 0.99 and 0.93. Their room-temperature resistivities were 5.1 × 10-4Ωcm and 5.4 × 10-4Ωcm, respectively. The growth mechanisms of the (110)- and (100)-oriented LNO films were discussed. [ABSTRACT FROM AUTHOR]
| Titel: |
PREPARATION OF (100)- AND (110)-ORIENTED LaNiO<subscript>3</subscript> THIN FILMS BY CHEMICAL SOLUTION DEPOSITION.
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| Autor/in / Beteiligte Person: | PILONG, WANG ; WEIBING, WU ; GUANGDA, HU ; SUHUA, FAN ; YANXIA, DING ; HAITAO, WU |
| Zeitschrift: | Surface Review & Letters, Jg. 14 (2007-02-01), Heft 1, S. 123-128 |
| Veröffentlichung: | 2007 |
| Medientyp: | academicJournal |
| ISSN: | 0218-625X (print) |
| DOI: | 10.1142/S0218625X07009177 |
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