Enhancement of Diffraction-Based Overlay Model for Overlay Target With Asymmetric Sidewall.
In: IEEE Transactions on Semiconductor Manufacturing, Jg. 33 (2020-08-01), Heft 3, S. 373-382
Online
academicJournal
Zugriff:
Titel: |
Enhancement of Diffraction-Based Overlay Model for Overlay Target With Asymmetric Sidewall.
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Autor/in / Beteiligte Person: | Su, Chun-Han ; Lin, Zi-Han ; Lin, Yu-Shin ; Kuo, Hung-Fei |
Link: | |
Zeitschrift: | IEEE Transactions on Semiconductor Manufacturing, Jg. 33 (2020-08-01), Heft 3, S. 373-382 |
Veröffentlichung: | 2020 |
Medientyp: | academicJournal |
ISSN: | 0894-6507 (print) |
DOI: | 10.1109/TSM.2020.3004040 |
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