Stoichiometry of thin silicon oxide layers on silicon
In: Applied Physics Letters, Jg. 24 (1974-02-01), Heft 3, S. 105-107
Online
serialPeriodical
Zugriff:
Titel: |
Stoichiometry of thin silicon oxide layers on silicon
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Autor/in / Beteiligte Person: | Sigmon, T. W. ; Chu, W. K. ; Lugujjo, E. ; Mayer, J. W. |
Link: | |
Zeitschrift: | Applied Physics Letters, Jg. 24 (1974-02-01), Heft 3, S. 105-107 |
Veröffentlichung: | 1974 |
Medientyp: | serialPeriodical |
ISSN: | 0003-6951 (print) ; 1077-3118 (print) |
DOI: | 10.1063/1.1655112 |
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