TRANSPORT PROPERTIES OF <font>CrO</font>2 (100) FILM GROWN ON <font>TiO</font>2 BY A SIMPLE ATMOSPHERE PRESSURE CHEMICAL VAPOR DEPOSITION
In: Surface Review and Letters, Jg. 21 (2014-08-01), S. 1450055-1450055
Online
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Zugriff:
Epitaxial CrO 2 (100)-oriented film was successfully fabricated on TiO 2 (100) substrate by a simple chemical vapor deposition in a two-zone furnace with oxygen flow from a CrO 3 precursor. The transport measurements show that the CrO 2 film is metallic with a small residual resistivity 4 μΩ cm down to 0.6 K. The temperature dependence of resistivity was best described by a phenomenological expression ρ(T) = ρ0 + AT2 exp (-Δ/T) over the range of 0.6–300 K with Δ = 123.6 K. The magnetization of the film becomes saturated in a relatively low field with a small coercive field. The temperature dependence of magnetization shows Bloch's T3/2 law and the slope of the curve suggests a critical wavelength of λΔ ~ 26.6 Å beyond which spin-flip scattering becomes important.
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TRANSPORT PROPERTIES OF <font>CrO</font>2 (100) FILM GROWN ON <font>TiO</font>2 BY A SIMPLE ATMOSPHERE PRESSURE CHEMICAL VAPOR DEPOSITION
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Autor/in / Beteiligte Person: | Jin Zhi Zhang ; Hong Guang Zhang ; Xie, Liang ; Nai Yi Cui |
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Zeitschrift: | Surface Review and Letters, Jg. 21 (2014-08-01), S. 1450055-1450055 |
Veröffentlichung: | World Scientific Pub Co Pte Lt, 2014 |
Medientyp: | unknown |
ISSN: | 1793-6667 (print) ; 0218-625X (print) |
DOI: | 10.1142/s0218625x14500553 |
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