Characteristics of Stacked Gate-All-Around Si Nanosheet MOSFETs With Metal Sidewall Source/Drain and Their Impacts on CMOS Circuit Properties
In: IEEE Transactions on Electron Devices, Jg. 68 (2021-06-01), S. 3124-3128
Online
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Zugriff:
In this brief, we computationally examine electrical characteristics of stacked gate-all-around Si nanosheet MOSFETs (GAA NS-FETs) with and without metal sidewall (MSW) source/drain (S/D) by increasing the number of channels (NCs) and their impacts on digital circuits. The ON-current ( ${I}_{ \mathrm{\scriptscriptstyle ON}}$ ) and circuit performances of the NS-FETs without the MSW S/D are limited to three channels due to the electrostatic potential decreasing from the top contacts to the bottom S/D side of NS-FETs; however, the MSW S/D can improve the ${I}_{\text {on}}$ with increasing the NCs over three channels because of low resistivity of tungsten ( $5.6\times 10^{-{6}}\,\, \Omega \cdot \text {cm}$ ) in the sidewall of S/D and then the circuit performances can be boost by the MSW S/D structure of the stacked GAA NS-FETs over three channels. For example, up to six channels of the NS-FETs with the MSW S/D, the frequency of ring oscillator is 57% increase, compared with the case without MSW S/D. The results of this study can be considered to design the S/D structure of the stacked GAA NS-FETs in emerging device technologies.
Titel: |
Characteristics of Stacked Gate-All-Around Si Nanosheet MOSFETs With Metal Sidewall Source/Drain and Their Impacts on CMOS Circuit Properties
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Autor/in / Beteiligte Person: | Sung, Wen-Li ; Li, Yiming |
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Zeitschrift: | IEEE Transactions on Electron Devices, Jg. 68 (2021-06-01), S. 3124-3128 |
Veröffentlichung: | Institute of Electrical and Electronics Engineers (IEEE), 2021 |
Medientyp: | unknown |
ISSN: | 1557-9646 (print) ; 0018-9383 (print) |
DOI: | 10.1109/ted.2021.3074126 |
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