Materials to Systems Co-Optimization Platform for Rapid Technology Development Targeting Future Generation CMOS Nodes
In: IEEE Transactions on Electron Devices, Jg. 68 (2021-11-01), S. 5358-5363
Online
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Zugriff:
Design technology co-optimization (DTCO) has been a workhorse in optimizing logic technology innovations for a few generations now. With increased complexity associated with each new node and the growing number of technological innovations, it is time to expand the conventional DTCO flows. In this article, we present a novel materials to systems co-optimization (MSCO) platform, expanding the boundaries of traditional DTCO to encompass materials modeling to all the way to system design. To demonstrate the application of our MSCO platform, we discuss various front-end-of-line (FEOL) and middle-of-line (MOL)/back-end-of-line (BEOL) technologies and show their impact on device and circuit performance.
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Materials to Systems Co-Optimization Platform for Rapid Technology Development Targeting Future Generation CMOS Nodes
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Autor/in / Beteiligte Person: | Pal, Ashish ; Reddy, Vinod ; Alexander, Blessy ; El Mehdi Bazizi ; Kim, Jongchol ; Ayyagari-Sangamalli, Buvna ; Jiang, Liu |
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Zeitschrift: | IEEE Transactions on Electron Devices, Jg. 68 (2021-11-01), S. 5358-5363 |
Veröffentlichung: | Institute of Electrical and Electronics Engineers (IEEE), 2021 |
Medientyp: | unknown |
ISSN: | 1557-9646 (print) ; 0018-9383 (print) |
DOI: | 10.1109/ted.2021.3076757 |
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