Nanowire Array-based MOSFET for Future CMOS Technology to Attain the Ultimate Scaling Limit

Silicon nanowire (SiNW) structures are the essential foundations of the next generation highly efficient and lowcost electronic devices because of their specific chemical, optical, and electrical properties. In recent decades, the production of pure Si NW arrays with the ability to tune the wire density and dimensions has been intensively studied. This paper demonstrates the performance of silicon nanowire (Si NW) array based cylindrical gate all around (GAA) MOSFET using quantum transport model in lower technology nodes. With an improvement in drain current and lower value of threshold voltage, the proposed structure is proving itself as one of the leaders in GAA MOSFET family. Again the study includes the effect of variation in gate voltage on the electrostatic potential of individual nanowires and the potential developed at the channel-source/drain interface. The improved ON current with superior electrostatic integrity due to silicon pillars is showing the possibility of this device towards future development in CMOS technology. Finally, the article includes the integration of nMOS and pMOS to realize the CMOS inverter for high speed and noise immune characteristics.