The influence of oxide surface layers on bulk electron probe microanalysis of oxygen-application to Ti-Si-O compounds
In: Scanning, Jg. 15 (1993), S. 165-170
Online
unknown
Zugriff:
Summary: This paper discusses a generalized method to measure with the electron probe microanalyzer (EPMA) the oxygen in a material containing a surface oxide layer. The continuum background is the most difficult to measure, particularly for materials in which oxygen-free samples cannot be produced. The method depends on the prepara tion of either oxygen-free samples or weIl characterized oxygen-containing samples. Specific application of the method to the Ti-Si-O system is discussed. In addition, measurements of oxide surface-layer thickness of 3.6-8.0 nm on Ti and Ti-Si compounds were obtained using EPMA and a scanning Auger nricroprobe (SAM). The nature of the oxide surface layers was shown using x-ray photoelec tron spectroscopy (XPS).
| Titel: |
The influence of oxide surface layers on bulk electron probe microanalysis of oxygen-application to Ti-Si-O compounds
|
|---|---|
| Autor/in / Beteiligte Person: | Choi, SK ; Bastin, GJ ; Sloof, WG ; Hjm Hans Heijligers ; van Fjj Frans Loo ; Goldstein, J.I. |
| Link: | |
| Zeitschrift: | Scanning, Jg. 15 (1993), S. 165-170 |
| Veröffentlichung: | Wiley, 1993 |
| Medientyp: | unknown |
| ISSN: | 0161-0457 (print) |
| DOI: | 10.1002/sca.4950150310 |
| Schlagwort: |
|
| Sonstiges: |
|