Formation of the XeI excimer sustained by dielectric barrier discharge in Xe/I2 at low pressure
In: Chinese Physics, Jg. 11 (2002-05-14), S. 568-571
Online
unknown
Zugriff:
Dielectric barrier discharge is used to study the mechanism of XeI excimer formation in the mixture of Xe and I2 at low pressures (
Titel: |
Formation of the XeI excimer sustained by dielectric barrier discharge in Xe/I2 at low pressure
|
---|---|
Autor/in / Beteiligte Person: | Li, Han ; Xiao-hui, Zhao ; Lian-Shui, Zhang |
Link: | |
Zeitschrift: | Chinese Physics, Jg. 11 (2002-05-14), S. 568-571 |
Veröffentlichung: | IOP Publishing, 2002 |
Medientyp: | unknown |
ISSN: | 1009-1963 (print) |
DOI: | 10.1088/1009-1963/11/6/309 |
Schlagwort: |
|
Sonstiges: |
|