Chemical Mechanical Polishing (CMP) in Magnetic Float Polishing (MFP) of Advanced Ceramic (Silicon Nitride) and Glass (Silicon Dioxide)
In: Key Engineering Materials, 2001-06-01, S. 1-14
Online
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Zugriff:
Titel: |
Chemical Mechanical Polishing (CMP) in Magnetic Float Polishing (MFP) of Advanced Ceramic (Silicon Nitride) and Glass (Silicon Dioxide)
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Autor/in / Beteiligte Person: | Jiang, M. ; Komanduri, R. |
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Zeitschrift: | Key Engineering Materials, 2001-06-01, S. 1-14 |
Veröffentlichung: | Trans Tech Publications, Ltd., 2001 |
Medientyp: | unknown |
ISSN: | 1662-9795 (print) |
DOI: | 10.4028/www.scientific.net/kem.202-203.1 |
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