Indium tin oxide with titanium doping for transparent conductive film application on CIGS solar cells
In: Applied Surface Science, Jg. 354 (2015-11-01), S. 31-35
Online
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Zugriff:
In this study, Ti-doped indium tin oxide (ITO:Ti) thin films were fabricated using a DC-magnetron sputtering deposition method. The thin films were grown without introducing oxygen or heating the substrate, and no post-growth annealing was performed after fabrication. The thickness of the ITO:Ti thin films (350 nm) was controlled while increasing the sputtering power from 50 to 150 W. According to the results, the optimal optoelectronic properties were observed in ITO:Ti thin films grown at a sputtering power of 100 W, yielding a reduced resistivity of 3.2 × 10 −4 Ω-cm and a mean high transmittance of 83% at wavelengths ranging from 400 to 800 nm. The optimal ITO:Ti thin films were used to fabricate a Cu(In,Ga)Se 2 solar cell that exhibited a photoelectric conversion efficiency of 11.3%, a short-circuit current density of 33.1 mA/cm 2 , an open-circuit voltage of 0.54 V, and a fill factor of 0.64.
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Indium tin oxide with titanium doping for transparent conductive film application on CIGS solar cells
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Autor/in / Beteiligte Person: | Huang, Shi-Da ; Liu, Wei-Sheng ; Li, Ying-Tse ; Hu, Hung-Chun ; Cheng, Huai-Ming ; Yu, Hau-Wei ; Pu, Nen-Wen ; Liang, Shih-Chang |
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Zeitschrift: | Applied Surface Science, Jg. 354 (2015-11-01), S. 31-35 |
Veröffentlichung: | Elsevier BV, 2015 |
Medientyp: | unknown |
ISSN: | 0169-4332 (print) |
DOI: | 10.1016/j.apsusc.2015.02.130 |
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