Electrically charged selectivity of poly-para-xylylene deposition
In: Chemical Communications, Jg. 52 (2016), S. 3022-3025
Online
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Zugriff:
The bottom-up patterning approach provides intrinsic advantages associated with unlimited resolution but is limited by the materials available for selection. A general and simple approach towards the selective deposition of poly-para-xylylenes is introduced in this communication. The chemical vapour deposition (CVD) of poly-para-xylylenes is inhibited on the high-energy surfaces of electrically charged conducting substrates. This technology provides an approach to selectively deposit poly-para-xylylenes irrespective of the substituted functionality and to pattern these polymer thin films from the bottom up.
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Electrically charged selectivity of poly-para-xylylene deposition
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Autor/in / Beteiligte Person: | Chen, Hsien-Yeh ; Liang, Wei-Chieh ; Ho, Hsin-Ying ; Chen, Yu-Ming ; Hsu, Hung-Lun ; Sun, Ho-Yi ; Wu, Chih-Yu |
Link: | |
Zeitschrift: | Chemical Communications, Jg. 52 (2016), S. 3022-3025 |
Veröffentlichung: | Royal Society of Chemistry (RSC), 2016 |
Medientyp: | unknown |
ISSN: | 1364-548X (print) ; 1359-7345 (print) |
DOI: | 10.1039/c5cc08059b |
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