Effects of (100)-textured LaNiO3 Electrode on the Deposition and Characteristics of PbTiO3 Thin Films Prepared by rf Magnetron Sputtering

Highly (100)-oriented thin films of PbTiO 3 were prepared on (100)-textured LNO/Pt/Ti/SiO 2 /Si substrates by rf magnetron sputtering at temperatures ≥480 °C, while randomly oriented PbTiO 3 films were obtained on Pt/Ti/SiO 2 /Si substrates. The textured LNO layer can help to control the orientation of PbTiO 3 thin films, and reduce their surface roughness quite significantly. The dielectric constant ( ε T ) of PbTiO 3 films deposited on LNO was lower than that of films on Pt and the dielectric loss (tan δ ) increased when a higher deposition temperature or longer time was used. The highly (100)-textured PbTiO 3 films also showed different ferroelectric hysteresis characteristics, i.e., a higher coercive field and a lower remanent polarization, from that of randomly oriented films deposited on Pt.