Electrical characterization and modeling of advanced nano-scale ultra thin body and buried oxide MOSFETs and application in circuit simulations ; Caractérisation et modélisation de UTBB MOSFET sur SOI pour les technologies CMOS avancées et applications en simulations circuits
In: https://theses.hal.science/tel-01690112 ; Micro et nanotechnologies/Microélectronique. Université Grenoble Alpes; Université Aristote (Thessalonique, Grèce), 2017. Français. ⟨NNT : 2017GREAT035⟩, 2017
Online
Hochschulschrift
Zugriff:
Τhe motivation for this dissertation is two of the main issues brought up by the scaling of new-era devices in contemporary MOSFET design: the development of an analytical and compact drain current model, valid in all regions of operation describing accurately the transfer and output characteristics of short-channel FDSOI devices and the investigation of reliability and variability issues of such advanced nanoscale transistors. Chapter II provides a theoretical and technical background for the better understanding of this dissertation, focusing on the critical MOSFET electrical parameters and the techniques for their extraction. It demonstrates the so-called Y-Function and Split-CV methodologies for electrical characterization in diverse types of semiconductors. The influence of AC signal oscillator level on effective mobility measurement by split C-V technique in MOSFETs is also analyzed. A new methodology based on the Lambert W function which allows the extraction of MOSFET parameters over the full gate voltage range, enabling to fully capture the transition between subthreshold and above threshold region, despite the reduction of supply voltage Vdd is presented. Finally, some basic elements concerning the low frequency noise (LFN) on MOSFETs characterization are described. Chapter III presents the analytical drain current compact modeling in nanoscale FDSOI MOSFETs. Simple analytical models for the front and back gate threshold voltages and ideality factors have been derived in terms of the device geometry parameters and the applied bias voltages with back gate control. An analytical compact drain current model has been developed for lightly doped UTBB FDSOI MOSFETs with back gate control, accounting for small geometry and other significant in such technologies effects and implemented via Verilog-A code for simulation of circuits in Cadence Spectre. Chapter IV is dealing with reliability issues in FDSOI transistors. The hot-carrier degradation of nanoscale UTBB FDSOI nMOSFETs has been investigated under ...
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Electrical characterization and modeling of advanced nano-scale ultra thin body and buried oxide MOSFETs and application in circuit simulations ; Caractérisation et modélisation de UTBB MOSFET sur SOI pour les technologies CMOS avancées et applications en simulations circuits
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Autor/in / Beteiligte Person: | Karatsori, Theano ; Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ) ; Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB Université de Savoie Université de Chambéry )-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes 2016-2019 (UGA 2016-2019 ) ; Université Grenoble Alpes ; Université Aristote (Thessalonique, Grèce) ; Ghibaudo, Gérard |
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Zeitschrift: | https://theses.hal.science/tel-01690112 ; Micro et nanotechnologies/Microélectronique. Université Grenoble Alpes; Université Aristote (Thessalonique, Grèce), 2017. Français. ⟨NNT : 2017GREAT035⟩, 2017 |
Veröffentlichung: | HAL CCSD, 2017 |
Medientyp: | Hochschulschrift |
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