Low pressure CVD of transparent Cu-Al-O and Cu-Ti-O thin films : International conference on thin film deposition of oxide multilayers hybrid structures
In: JOURNAL DE PHYSIQUE 4 11(NO 11):Pr11-253-Pr11-260; Jg. 11 (2001) NO 11, S. Pr11-253- (8S.)
Konferenz
Zugriff:
Titel: |
Low pressure CVD of transparent Cu-Al-O and Cu-Ti-O thin films : International conference on thin film deposition of oxide multilayers hybrid structures
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Autor/in / Beteiligte Person: | Barreca, D. ; Battiston, G. A. ; Casellato, U. ; Gerbasi, R. ; Tondello, E. |
Link: | |
Quelle: | JOURNAL DE PHYSIQUE 4 11(NO 11):Pr11-253-Pr11-260; Jg. 11 (2001) NO 11, S. Pr11-253- (8S.) |
Veröffentlichung: | 2001 |
Medientyp: | Konferenz |
ISBN: | 978-2-86883-573-4 (print) ; 2-86883-573-2 (print) |
ISSN: | 1155-4339 (print) |
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