2E4.42 Fabrication and Characteristics of the Suppressed Sidewall Injection Magnetotransistor using a CMOS Process : Solid-state sensors, actuators and microsystems; Transducers '05
In: TRANSDUCERS; 2005 1:617-620
Konferenz
Zugriff:
Titel: |
2E4.42 Fabrication and Characteristics of the Suppressed Sidewall Injection Magnetotransistor using a CMOS Process : Solid-state sensors, actuators and microsystems; Transducers '05
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Autor/in / Beteiligte Person: | Song, Y. G. ; Ryu, J. G. ; Choi, Y. S. ; Kim, N. H. |
Link: | |
Quelle: | TRANSDUCERS; 2005 1:617-620 |
Veröffentlichung: | 2005 |
Medientyp: | Konferenz |
ISBN: | 978-0-7803-8994-6 (print) ; 0-7803-8994-8 (print) |
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