Integration of Solid Phase Epitaxial Re-Growth, Flash and Sub-Melt Laser Annealing for S/D Junctions in CMOS Digital Technology : Doping engineering for device fabrication
In: MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS; (2006) S. 77-90
Konferenz
Zugriff:
Titel: |
Integration of Solid Phase Epitaxial Re-Growth, Flash and Sub-Melt Laser Annealing for S/D Junctions in CMOS Digital Technology : Doping engineering for device fabrication
|
---|---|
Autor/in / Beteiligte Person: | Severi, S. ; Augendre, E. ; De Meyer, K. |
Link: | |
Quelle: | MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS; (2006) S. 77-90 |
Veröffentlichung: | 2006 |
Medientyp: | Konferenz |
Sonstiges: |
|