Improvement of interfacial and microstructure properties of high-k ZrO2 thin films fabricated by filtered cathodic arc deposition using nitrogen incorporation : International conference on surface modification of materials by ion beams; SMMIB '05
In: SURFACE AND COATINGS TECHNOLOGY 201(19/20):8282-8285; Jg. 201 (2007) 19/20, S. 8282-8285
Konferenz
Zugriff:
Titel: |
Improvement of interfacial and microstructure properties of high-k ZrO2 thin films fabricated by filtered cathodic arc deposition using nitrogen incorporation : International conference on surface modification of materials by ion beams; SMMIB '05
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Autor/in / Beteiligte Person: | Huang, A. P. ; Di, Z. F. ; Fu, R. K. ; Chu, P. K. |
Link: | |
Quelle: | SURFACE AND COATINGS TECHNOLOGY 201(19/20):8282-8285; Jg. 201 (2007) 19/20, S. 8282-8285 |
Veröffentlichung: | 2007 |
Medientyp: | Konferenz |
ISSN: | 0257-8972 (print) |
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