Effect of Substrate Temperature on Hardness and Transparency of SiOC(-H) Thin Films Synthesized by Atmospheric Pressure Plasma Enhanced CVD Method : Amorphous and polycrystalline thin-film silicon science and technology
In: MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS 1321:217-222; Jg. 1321 (2011) S. 217-222
Konferenz
Zugriff:
Titel: |
Effect of Substrate Temperature on Hardness and Transparency of SiOC(-H) Thin Films Synthesized by Atmospheric Pressure Plasma Enhanced CVD Method : Amorphous and polycrystalline thin-film silicon science and technology
|
---|---|
Autor/in / Beteiligte Person: | Noborisaka, M. ; Nagashima, S. ; Hayashi, H. ; Ueda, N. ; Kumagai, K. ; Shirakura, A. ; Suzuki, T. |
Link: | |
Quelle: | MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS 1321:217-222; Jg. 1321 (2011) S. 217-222 |
Veröffentlichung: | 2011 |
Medientyp: | Konferenz |
ISBN: | 978-1-60511-298-5 (print) ; 1-60511-298-4 (print) |
Sonstiges: |
|