Improved Observation Contrast of Block-Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM) : Advanced micro-device engineering
In: KEY ENGINEERING MATERIALS 534:126-130; Jg. 534 (2012) S. 126-130
Online
Konferenz
Zugriff:
Titel: |
Improved Observation Contrast of Block-Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM) : Advanced micro-device engineering
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Autor/in / Beteiligte Person: | Akahane, T. ; Komori, T. ; Liu, J. ; Huda, M. ; Mohamad, Z.B. ; Yin, Y. ; Hosaka, S. |
Link: | |
Quelle: | KEY ENGINEERING MATERIALS 534:126-130; Jg. 534 (2012) S. 126-130 |
Veröffentlichung: | 2012 |
Medientyp: | Konferenz |
ISBN: | 978-3-03785-539-3 (print) ; 3-03785-539-8 (print) |
ISSN: | 1013-9826 (print) |
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