3D NTD resist deformation compact model for OPC and ILT applications : Photomask technology (Symposium)
In: Proceedings of SPIE, the International Society for Optical Engineering 10810:10810-44; Jg. 10810 (2018) S. 10810-10844
Konferenz
Zugriff:
Titel: |
3D NTD resist deformation compact model for OPC and ILT applications : Photomask technology (Symposium)
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Quelle: | Proceedings of SPIE, the International Society for Optical Engineering 10810:10810-44; Jg. 10810 (2018) S. 10810-10844 |
Veröffentlichung: | 2018 |
Medientyp: | Konferenz |
ISSN: | 0277-786X (print) |
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