Lattice Defects Diffuse Scattering from Thin Films of a Ge-Si System with Low-Energy Ar+ and Xe+ Bombardment During Molecular Beam Epitaxy (MBE) Growth
In: METALLURGICAL AND MATERIALS TRANSACTIONS A, Jg. 44 (2013), Heft 1, S. 102-114
Online
serialPeriodical
Zugriff:
Titel: |
Lattice Defects Diffuse Scattering from Thin Films of a Ge-Si System with Low-Energy Ar+ and Xe+ Bombardment During Molecular Beam Epitaxy (MBE) Growth
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Autor/in / Beteiligte Person: | Rozenak, P. |
Link: | |
Zeitschrift: | METALLURGICAL AND MATERIALS TRANSACTIONS A, Jg. 44 (2013), Heft 1, S. 102-114 |
Veröffentlichung: | 2013 |
Medientyp: | serialPeriodical |
ISSN: | 1073-5623 (print) |
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