Comparison of Conventional and Maskless Lithographic Techniques for More than Moore Post-Processing of Foundry CMOS Chips
In: Journal of microelectromechanical systems, Jg. 29 (2020), Heft 5, S. 1245-1252
Online
serialPeriodical
Zugriff:
Titel: |
Comparison of Conventional and Maskless Lithographic Techniques for More than Moore Post-Processing of Foundry CMOS Chips
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Autor/in / Beteiligte Person: | Tsiamis, Andreas ; Li, Yifan ; Dunare, Camelia ; Marland, Jamie R. K. ; Blair, Ewen O. ; Smith, Stewart ; Terry, Jonathan G. ; Mitra, Srinjoy ; Underwood, Ian ; Murray, Alan F. ; Walton, Anthony J. |
Link: | |
Zeitschrift: | Journal of microelectromechanical systems, Jg. 29 (2020), Heft 5, S. 1245-1252 |
Veröffentlichung: | 2020 |
Medientyp: | serialPeriodical |
ISSN: | 1057-7157 (print) |
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