Reliable metal–graphene contact formation process flows in a CMOS-compatible environment
In: Nanoscale advances, Jg. 4 (2022), Heft 20, S. 4373-4380
Online
serialPeriodical
Zugriff:
Titel: |
Reliable metal–graphene contact formation process flows in a CMOS-compatible environment
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Autor/in / Beteiligte Person: | Elviretti, M. ; Lisker, M. ; Lukose, R. ; Lukosius, M. ; Akhtar, F. ; Mai, A. |
Link: | |
Zeitschrift: | Nanoscale advances, Jg. 4 (2022), Heft 20, S. 4373-4380 |
Veröffentlichung: | 2022 |
Medientyp: | serialPeriodical |
ISSN: | 2516-0230 (print) |
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