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The reaction of Os3(CO)12 with 1.2 eq. of pyrazole (3,5-(CF3)2-pz)H at 190 C affords triosmium complex Os3(CO)10(3,5-(CF3)2-pz)(μ-H) (1) as the isolable product. Upon further treatment with excess pyrazole (3,5-(CF3)2-pz)H under more forcing conditions, complex 1 converts to a diosmium pyrazolate complex [Os(CO)3(3,5-(CF3)2-pz)]2 (2) in high yield. These osmium complexes are characterized by spectroscopic methods and single crystal X-ray diffraction study, showing the expected triangular and linear Os-Os backbone and with one and two bridging pyrazolate ligands for complexes 1 and 2, respectively. The thermal properties are studied by TG analysis and the deposition experiments are carried out using a cold-wall CVD apparatus. The as-deposited thin films are characterized using XPS, XRD and SEM and electrical resistivity measurement. It seems that the Os metal thin films are best deposited at an optimal temperature of 450-500 °C and using complex 2 as the source reagent.

Titel:	Deposition of osmium thin films using pyrazolate complexes as CVD source reagents
Autor/in / Beteiligte Person:	YUN, CHI ; YU, Huan-Li ; CHING, Wei-Li ; LIU, Chao-Shiuan ; CHEN, Yao-Lun ; CHOU, Tsung-Yi ; PENG, Shie-Ming ; LEE, Gene-Hsiang
Link:	Full Text Finder (Volltext) View record from PASCAL Archive
Zeitschrift:	Journal of material chemistry, Jg. 12 (2002), Heft 5, S. 1363-1369
Veröffentlichung:	Cambridge: Royal Society of Chemistry, 2002
Medientyp:	academicJournal
Umfang:	print, 19 ref
ISSN:	0959-9428 (print)
Schlagwort:	Chemistry Chimie Sciences exactes et technologie Exact sciences and technology Physique Physics Etat condense: structure, proprietes mecaniques et thermiques Condensed matter: structure, mechanical and thermal properties Structure des liquides et des solides; cristallographie Structure of solids and liquids; crystallography Structure de solides cristallins particuliers Structure of specific crystalline solids Composés minéraux Inorganic compounds Métaux carbonyles et nitrosyles, et leurs complexes Carbonyl and nitrosyl compounds, and their complexes Domaines interdisciplinaires: science des materiaux; rheologie Cross-disciplinary physics: materials science; rheology Science des matériaux Materials science Méthodes de dépôt de films et de revêtements; croissance de films et épitaxie Methods of deposition of films and coatings; film growth and epitaxy Dépôt chimique en phase vapeur (incluant le cvd activé par plasma, mocvd, etc.) Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Sciences appliquees Applied sciences Metaux. Metallurgie Metals. Metallurgy Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.) Fluor Composé organique Fluorine Organic compounds Métal transition Carbonyle Complexe Transition elements Carbonyls Complexes Métal transition Transition elements Complexe hydruro Hydrido complex Complejo hidruro Complexe mu Mu complex Complejo mu Complexe trinucléaire Trinuclear complex Complejo trinuclear Conductivité électrique Electrical conductivity Couche mince Thin films Croissance cristalline en phase vapeur Crystal growth from vapors Diffraction RX XRD Dépôt chimique phase vapeur CVD Etude expérimentale Experimental study Microscopie électronique balayage Scanning electron microscopy Osmium Carbonyle Complexe Osmium Carbonyls Complexes Osmium Carbonyle Osmium Carbonyls Osmium Précurseur Precursor Préparation chimique Chemical preparation Spectre photoélectron RX X-ray photoelectron spectra Structure cristalline Crystal structure Structure moléculaire Molecular structure Os Pyrazole(3,5-bis[trifluorométhyl])
Sonstiges:	Nachgewiesen in: PASCAL Archive Sprachen: English Original Material: INIST-CNRS Document Type: Article File Description: text Language: English Author Affiliations: Department of Chemistry, National Tsing Hua University, Hsinchu 30013, Tawain, Province of China ; Department of Chemistry and Instrumentation Center, National Taiwan University, Taipei, 10764, Tawain, Province of China Rights: Copyright 2002 INIST-CNRS ; CC BY 4.0 ; Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS Notes: Metals. Metallurgy ; Physics and materials science ; Physics of condensed state: structure, mechanical and thermal properties

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Deposition of osmium thin films using pyrazolate complexes as CVD source reagents