High-density V-groove InGaAs/AlGaAs quantum wires on submicron gratings by constant growth technique
In: ICCG-13/ICVGE-11: Proceedings of the Thirteenth International Conference on Crystal Growth in conjunction with the Eleventh International Conference on Vapor Growth and Epitaxy, Kyoto, Japan, 30 July - 4 August 2001. Part 2Journal of crystal growth 237-39:1486-1490; Jg. 237-39 (2002) S. 1486-1490
Konferenz
- print, 7 ref 2
Zugriff:
High-density InGaAs/AlGaAs quantum wire (QWR) structures with a period of 430 nm were successfully grown by using constant metalorganic chemical vapor deposition growth technique in which submicron gratings were preserved even after an epitaxial growth of 1 μm thickness, The quantum confinement effect of the InGaAs/AlGaAs QWRs is strong due to the large band offset and enhanced migration of surface adsorbed III-group element species compared with the GaAs/AlGaAs QWRs. The photoluminescence signal of the InGaAs/AlGaAs QWRs was observed in the temperature range from 10 to 300 K with a relatively narrow full width at half maximum of <40 meV.
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High-density V-groove InGaAs/AlGaAs quantum wires on submicron gratings by constant growth technique
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Autor/in / Beteiligte Person: | TSURUMACHI, Noriaki ; SON, Chang-Sik ; TAE GEUN, KIM ; OGURA, Mutsuo |
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Quelle: | ICCG-13/ICVGE-11: Proceedings of the Thirteenth International Conference on Crystal Growth in conjunction with the Eleventh International Conference on Vapor Growth and Epitaxy, Kyoto, Japan, 30 July - 4 August 2001. Part 2Journal of crystal growth 237-39:1486-1490; Jg. 237-39 (2002) S. 1486-1490 |
Veröffentlichung: | Amsterdam: Elsevier, 2002 |
Medientyp: | Konferenz |
Umfang: | print, 7 ref 2 |
ISSN: | 0022-0248 (print) |
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