Summary of research in NEDO Cat-CVD project in Japan
In: Proceedings of the First International Conference on Cat-CVD (Hot-Wire CVD) Process, Kanazawa, Japan, November 14-17, 2000Thin solid films 395(1-2):1-11; Jg. 395 (2001) 1-2, S. 1-11
Konferenz
- print, 40 ref
Zugriff:
This paper reviews the recent progress in the catalytic chemical vapor deposition (Cat-CVD) research project, supported by the New Energy and Industrial Technology Development Organization (NEDO). Based on the results obtained in the project, firstly, the deposition mechanism of Cat-CVD is discussed, together with fundamental issues required for making a deposition apparatus. Secondly, the properties of Cat-CVD Si-based thin films such as amorphous silicon (a-Si), polycrystalline silicon (poly-Si), and silicon nitride (SiNx) films are demonstrated. Finally, the feasibility of such films for device application is discussed.
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Summary of research in NEDO Cat-CVD project in Japan
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Autor/in / Beteiligte Person: | MATSUMURA, Hideki |
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Quelle: | Proceedings of the First International Conference on Cat-CVD (Hot-Wire CVD) Process, Kanazawa, Japan, November 14-17, 2000Thin solid films 395(1-2):1-11; Jg. 395 (2001) 1-2, S. 1-11 |
Veröffentlichung: | Lausanne: Elsevier Science, 2001 |
Medientyp: | Konferenz |
Umfang: | print, 40 ref |
ISSN: | 0040-6090 (print) |
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