Micro-structural analysis of carbon nitride (CNx) film prepared by ion beam assisted magnetron sputtering
In: Diamond 2001 : Proceedings of the 12th European Conference on Diamond, Dia mond-like Materials, Carbon Nanotubes, Nitrides & Silicon CarbideDiamond and related materials 11(3-6):1205-1209; Jg. 11 (2002) 3-6, S. 1205-1209
Konferenz
- print, 10 ref
Zugriff:
The growth and structural evolution of carbon nitride (CNx) films, deposited by nitrogen ion beam assisted magnetron sputtering, were studied. The deposition rate, composition ([N]/[C] ratio), structure, and mechanical properties of CN, films were investigated as a function of nitrogen ion energy in the range of 30 eV-1 keV. For the ion energy below 200 eV, the increasing fraction of curved structure as revealed by transmission electron microscopy and sp3 hybridized bonding were attributed to structural transition and improved mechanical properties of CNx films. However, when increasing nitrogen ion energy above 200 eV, the [N]/[C] ratio in film was inversely proportional to the nitrogen ion energy and preferential distribution of nitrogen in sp2 hybridized site induced the retransition from curved structure to planar structure. From these results, it was found that CNx films exhibit two different structural and bonding characteristics with ion energy and this transition of film characteristic is closely related to the nitrogen content in the film.
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Micro-structural analysis of carbon nitride (CNx) film prepared by ion beam assisted magnetron sputtering
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Autor/in / Beteiligte Person: | JUNG, Hae-Suk ; PARK, Hyung-Ho |
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Quelle: | Diamond 2001 : Proceedings of the 12th European Conference on Diamond, Dia mond-like Materials, Carbon Nanotubes, Nitrides & Silicon CarbideDiamond and related materials 11(3-6):1205-1209; Jg. 11 (2002) 3-6, S. 1205-1209 |
Veröffentlichung: | Amsterdam: Elsevier, 2002 |
Medientyp: | Konferenz |
Umfang: | print, 10 ref |
ISSN: | 0925-9635 (print) |
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