Micromachined SU8 negative resist for MMIC applications on low resistivity CMOS substrates
In: Proceedings of the 28th International Conference on Micro- and Nano-Engineering, September 16-19, 2002, Lugano, SwitzerlandMicroelectronic engineering 67-68:417-421; Jg. 67-68 (2003) S. 417-421
Konferenz
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Zugriff:
In this work we report a novel method of fabricating low loss coplanar waveguides (CPW) on CMOS grade low resistivity silicon (2Ω-cm) substrates using a micro-machined SU8 negative resist as a dielectric interface layer. S parameter measurements up 110 GHz and electromagnetic analysis was used to determine the performance of the CPW on the SU8 dielectric interface layer. An attenuation of less than 0.6 dB/mm at 60 GHz was achieved.
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Micromachined SU8 negative resist for MMIC applications on low resistivity CMOS substrates
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Autor/in / Beteiligte Person: | ELGAID, Khaled ; MCCLOY, David A ; THAYNE, Iain G |
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Quelle: | Proceedings of the 28th International Conference on Micro- and Nano-Engineering, September 16-19, 2002, Lugano, SwitzerlandMicroelectronic engineering 67-68:417-421; Jg. 67-68 (2003) S. 417-421 |
Veröffentlichung: | Amsterdam: Elsevier Science, 2003 |
Medientyp: | Konferenz |
Umfang: | print, 4 ref |
ISSN: | 0167-9317 (print) |
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