Extremely scaled silicon nano-CMOS devices
In: Nanoelectronics and nasoscale processing, Jg. 91 (2003), Heft 11, S. 1860-1873
Online
academicJournal
- print, 67 ref
Zugriff:
Silicon-based CMOS technology can be scaled well into the nanometer regime. High-performance, planar, ultrathin-body devices fabricated on silicon-on-insulator substrates have been demonstrated down to 15-nm gate lengths. We have also introduced the FinFET, a double-gate device structure that is relatively simple to fabricate and can be scaled to gate lengths below 10 nm. In this paper, some of the key elements of these technologies are described, including sublithographic patterning, the effects of crystal orientation and roughness on carrier mobility, gate work function engineering, circuit performance, and sensitivity to process-induced variations.
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Extremely scaled silicon nano-CMOS devices
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Autor/in / Beteiligte Person: | LELAND, CHANG ; CHOI, Yang-Kyu ; HA, Daewon ; RANADE, Pushkar ; SHIYING, XIONG ; BOKOR, Jeffrey ; CHENMING, HU ; KING, Tsu-Jae |
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Zeitschrift: | Nanoelectronics and nasoscale processing, Jg. 91 (2003), Heft 11, S. 1860-1873 |
Veröffentlichung: | New York, NY: Institute of Electrical and Electronics Engineers, 2003 |
Medientyp: | academicJournal |
Umfang: | print, 67 ref |
ISSN: | 0018-9219 (print) |
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