Si3N4 recubierto con diamante CVD mediante filamento caliente y plasma generado por microondas
In: VII Reunion nacional de materiales, 16-18 octubre 2002, MadridBoletín de la Sociedad Española de Cerámica y Vidrio 43(2):473-476; Jg. 43 (2004) 2, S. 473-476
Konferenz
- print, 13 ref
Zugriff:
Silicon nitride substrates have been diamond coated by hot-filament (home made) and microwave plasma (commercial) CVD reactors. The importance of Si3N4 as substrate relies on its favoured adhesion to the diamond film, as required in wear applications. Diamond coatings have been characterized by μ-Raman spectroscopy, X-ray diffraction, scanning electron microscopy and atomic force microscopy. The diamond film/substrate adhesion has been evaluated by performing Brale indentations at different loads. The diamond films grown by hot filament matched those grown by microwave plasma in terms of morphology and diamond quality, only loosing in uniformity. Spherical substrates have also been used to compare the films coated by both techniques.
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Si3N4 recubierto con diamante CVD mediante filamento caliente y plasma generado por microondas
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Verantwortlichkeitsangabe: | Diamond coating on Si3N4 by hot filament and microwave plasma assisted CVD |
Autor/in / Beteiligte Person: | TALLAIRE, A ; OLIVEIRA, F. J ; FERNANDES, A. J. S ; COSTA, F. M ; BELMONTE, M ; SILVA, R. F |
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Quelle: | VII Reunion nacional de materiales, 16-18 octubre 2002, MadridBoletín de la Sociedad Española de Cerámica y Vidrio 43(2):473-476; Jg. 43 (2004) 2, S. 473-476 |
Veröffentlichung: | Madrid: Sociedad Española de Cerámica y Vidrio, 2004 |
Medientyp: | Konferenz |
Umfang: | print, 13 ref |
ISSN: | 0366-3175 (print) |
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