Surface and nanomechanical properties of Si:C:H films prepared by RF plasma beam CVD

TOTH, A ; MOHAI, M ; et al.

In: Proceedings of Diamond 2004, the 15th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides & Silicon CarbideDiamond and related materials 14(3-7):954-958; Jg. 14 (2005) 3-7, S. 954-958

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Si-, SiOx- and SiNx-containing a-C:H films (denoted as DLCSi, DLCSiO and DLCSiN) were deposited respectively from tetramethylsilane, hexamethyldisiloxane and hexamethyldisilazane precursors onto silicon wafer and aluminium substrates, using electron cyclotron wave resonance (ECWR) plasma beam CVD. Surface chemical analysis was performed by X-ray photoelectron spectroscopy and X-ray induced Auger electron spectroscopy. Nanomechanical properties like hardness and reduced modulus were determined by the nanoindentation method. For the DLCSi layers the C/Si ratio increased with the increase of the self-bias. Nanohardness and reduced modulus had a strong tendency to increase with increasing C/Si. The modified Auger parameter for silicon (Si a) and the bulk plasmon loss energy of the C Is peak (Ep) also increased with C/Si. For the whole set of Si-containing a-C:H film samples a correlation has been established between Si a and Ep.

Titel:	Surface and nanomechanical properties of Si:C:H films prepared by RF plasma beam CVD
Autor/in / Beteiligte Person:	TOTH, A ; MOHAI, M ; UJVARI, T ; BERTOTI, I
Link:	E-Journal im Bestand der UB Hagen? View record from PASCAL Archive
Quelle:	Proceedings of Diamond 2004, the 15th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides & Silicon CarbideDiamond and related materials 14(3-7):954-958; Jg. 14 (2005) 3-7, S. 954-958
Veröffentlichung:	Amsterdam: Elsevier, 2005
Medientyp:	Konferenz
Umfang:	print, 33 ref
ISSN:	0925-9635 (print)
Schlagwort:	Crystallography Cristallographie cristallogenèse Sciences exactes et technologie Exact sciences and technology Physique Physics Etat condense: structure, proprietes mecaniques et thermiques Condensed matter: structure, mechanical and thermal properties Propriétés mécaniques et acoustiques de l'état condensé Mechanical and acoustical properties of condensed matter Propriétés mécaniques des nanostructures et des nanomatériaux Mechanical properties of nanoscale materials Etat condense: structure electronique, proprietes electriques, magnetiques et optiques Condensed matter: electronic structure, electrical, magnetic, and optical properties Emissions électronique et ionique; phénomènes d'impact Electron and ion emission by liquids and solids; impact phenomena Photoémission et spectres photoélectroniques Photoemission and photoelectron spectra Couches adsorbées et couches minces Adsorbed layers and thin films Domaines interdisciplinaires: science des materiaux; rheologie Cross-disciplinary physics: materials science; rheology Science des matériaux Materials science Méthodes de dépôt de films et de revêtements; croissance de films et épitaxie Methods of deposition of films and coatings; film growth and epitaxy Dépôt chimique en phase vapeur (incluant le cvd activé par plasma, mocvd, etc.) Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.) Composé minéral Inorganic compounds Carbone Carbon Couche mince Thin films Dépôt chimique phase vapeur CVD Effet concentration Quantity ratio Etude expérimentale Experimental study Matériau amorphe hydrogéné Amorphous hydrogenated material Méthode PECVD PECVD Méthode phase vapeur Growth from vapor Método fase vapor Nanodureté Nanohardness Nanodureza Nanoindentation Nanoindentacion Plasmon Plasmons Précurseur Precursor Préparation Preparation Preparación Résonance cyclotronique électronique Electron cyclotron-resonance Silicium nitrure Silicon nitrides Silicium oxyde Silicon oxides Spectre photoélectron RX X-ray photoelectron spectra Spectrométrie Auger AES O Si Si:C:H SiOx Substrat Al Substrat Si a-C:H Diamond-like carbon Mechanical properties Plasma CVD Surface characterization
Sonstiges:	Nachgewiesen in: PASCAL Archive Sprachen: English Original Material: INIST-CNRS Document Type: Conference Paper File Description: text Language: English Author Affiliations: Institute of Materials and Environmental Chemistry, Chemical Research Center, Hungarian Academy of Sciences, Pusztaszeri út 59-67, 1025 Budapest, Hungary Rights: Copyright 2005 INIST-CNRS ; CC BY 4.0 ; Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS Notes: Physics and materials science ; Physics of condensed state: electronic structure, electrical, magnetic and optical properties ; Physics of condensed state: structure, mechanical and thermal properties

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