A 64 x 64 CMOS active pixel sensor operative at a very low illumination level
In: Optical review, Jg. 12 (2005), Heft 3, S. 196-201
Online
academicJournal
- print, 11 ref
Zugriff:
A CMOS image sensor that focuses on very low illumination applications is described. The sensor uses a 0.35 μm 2-poly 4-metal standard CMOS process and is realized as a 64 x 64 array of 7.8 x 7.4 μm2 active pixels with a fill factor of 33%. The unit pixel contains 3 NMOSFETs and a gate-body tied PMOSFET photodetector. The image sensor features highly sensitive characteristics because of the photodetector which has a maximum photo-responsivity of 2.5 x 102 A/W, and a pixel configuration with a voltage gain of about 1.3 and a pixel sensitivity of 1.2 x 10 V/lx.s. Furthermore, this sensor has a well-defined output voltage at a very low illumination level of sub-10 lx, such as with a photo-sensitivity of 35 mV/lx without adjusting gain and integration time.
Titel: |
A 64 x 64 CMOS active pixel sensor operative at a very low illumination level
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Autor/in / Beteiligte Person: | PARK, Jae-Hyoun ; KIM, Hoon ; SEO, Sang-Ho ; SHIN, Jang-Kyoo |
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Zeitschrift: | Optical review, Jg. 12 (2005), Heft 3, S. 196-201 |
Veröffentlichung: | Berlin: Springer, 2005 |
Medientyp: | academicJournal |
Umfang: | print, 11 ref |
ISSN: | 1340-6000 (print) |
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