The mechanism of alumina formation from TMA and molecular oxygen using Catalytic-CVD with a tungsten catalyzer
In: Proceedings of the Third International Conference on Hot-Wire CVD (Cat-CVD) Process, Utrecht, The Netherlands, August 23-27, 2004Thin solid films 501(1-2):39-42; Jg. 501 (2006) 1-2, S. 39-42
Konferenz
- print, 12 ref
Zugriff:
The mechanism of alumina formation from tri-methyl aluminum and oxygen (O2) using catalytic-chemical vapor deposition with a tungsten catalyzer was investigated using quadrupole mass spectrometry. Above 500 °C, the tungsten catalyzer allowed Al to separate from TMA. The decrease in O2 and alumina film growth all occurred at 500 °C. From these results, it was concluded that the Al, derived from the decomposition of TMA, reacted with O2 to produce A1O via a vapor phase chemical reaction. The alumina films can be deposited onto Si wafers at low substrate temperatures including room temperature.
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The mechanism of alumina formation from TMA and molecular oxygen using Catalytic-CVD with a tungsten catalyzer
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Autor/in / Beteiligte Person: | OGITA, Yoh-Ichiro ; TOMITA, Toshiyuki |
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Quelle: | Proceedings of the Third International Conference on Hot-Wire CVD (Cat-CVD) Process, Utrecht, The Netherlands, August 23-27, 2004Thin solid films 501(1-2):39-42; Jg. 501 (2006) 1-2, S. 39-42 |
Veröffentlichung: | Lausanne: Elsevier Science, 2006 |
Medientyp: | Konferenz |
Umfang: | print, 12 ref |
ISSN: | 0040-6090 (print) |
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