Degradation of static and dynamic behavior of CMOS inverters during constant and pulsed voltage stress
In: 17th European Symposium on Reliability of Electron Devices, Failure Physics and Analysis (ESREF 2006), Wuppertal, Germany, 3-6 October 2006Microelectronics and reliability 46(9-11):1669-1672
Konferenz
- print, 6 ref
Zugriff:
We study the degradation of CMOS inverters under DC and pulsed stress conditions before the occurrence of the gate oxide breakdown. Our results show an overall speed reduction, caused by the transistor drain current drop, and a leftward shift of the inverter voltage transfer characteristics, due to a larger degradation of the PMOSFET as compared to the NMOSFET. We attribute this behavior to the build-up of defects/trapped charge featuring a different kinetics in P- and N-type MOSFETs.
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Degradation of static and dynamic behavior of CMOS inverters during constant and pulsed voltage stress
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Autor/in / Beteiligte Person: | GERARDIN, S ; GRIFFONI, A ; CESTER, A ; PACCAGNELLA, A ; GHIDINI, G |
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Quelle: | 17th European Symposium on Reliability of Electron Devices, Failure Physics and Analysis (ESREF 2006), Wuppertal, Germany, 3-6 October 2006Microelectronics and reliability 46(9-11):1669-1672 |
Veröffentlichung: | Oxford: Elsevier, 2006 |
Medientyp: | Konferenz |
Umfang: | print, 6 ref |
ISSN: | 0026-2714 (print) |
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