Fabrication of transparent p-n junction composed of heteroepitaxially grown p-Li0.15Ni0.85O and n-ZnO films for UV-detector applications
In: Applied physics. A, Materials science & processing (Print), Jg. 87 (2007), Heft 4, S. 787-791
Online
academicJournal
- print, 17 ref
Zugriff:
Thin films of high-quality p-type Li0.15Ni0.85O (LNO) and n-type ZnO were heteroepitaxially grown on MgO(111) substrate by pulsed laser deposition technique to form transparent wide bandgap heterojunctions. The epitaxial nature of this p-LNO/n-ZnO/MgO heterojunction was confirmed to be (111)LNO∥ (0001)ZnO∥ (11 1)MgO (out-of-plane) and (002)LNON∥(1002)ZnO∥ (002)MgO (in-plane) by X-ray diffraction. Optical transmittance spectrum and I-V characteristics were obtained at room temperature. The heterojunction exhibits reasonable optical transmittance of 50%-60% on average in the whole infrared and visible region, and highly asymmetric electrical rectification with a turn-on voltage of about 1.0V and a small leakage current. The highest photoresponsivity for a wavelength of 350 nm is 3.4 × 103 V/W when the junction is irradiated under 5 μW UV illumination. The spectral response peak is obtained in the UV region and a reasonable large responsivity is shown for this p-LNO/n-ZnO/MgO heterojunction, which suggests the possibility of an inexpensive transparent oxide UV detector in a wide variety of electronics applications.
Titel: |
Fabrication of transparent p-n junction composed of heteroepitaxially grown p-Li0.15Ni0.85O and n-ZnO films for UV-detector applications
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Autor/in / Beteiligte Person: | ZHUANG, L ; WONG, K. H |
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Zeitschrift: | Applied physics. A, Materials science & processing (Print), Jg. 87 (2007), Heft 4, S. 787-791 |
Veröffentlichung: | Berlin: Springer, 2007 |
Medientyp: | academicJournal |
Umfang: | print, 17 ref |
ISSN: | 0947-8396 (print) |
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