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Chemical bath deposition of CdO thin films using three different complexing agents, namely ammonia, ethanolamine, and methylamine is investigated. CdSO4 is used as Cd precursor, while H2O2 is used as an oxidation agent. As-grown films are mainly cubic CdO2, with some Cd(OH)2 as well as CdO phases being detected. Annealing at 400 °C in air for 1 h transforms films into cubic CdO. The calculated optical band gap of as-grown films is in the range of 3.37-4.64 eV. Annealed films have a band gap of about 2.53 eV. Rutherford backscattering spectroscopy of as-grown films reveals cadmium to oxygen ratio of 1.00:1.74 ±0.01 while much better stoichiometry is obtained after annealing, in accordance with the X-ray diffraction results. A carrier density as high as 1.89 × 1020 cm-3 and a resistivity as low as 1.04 x 10-2 Ω-cm are obtained.

Titel:	Investigation of chemical bath deposition of CdO thin films using three different complexing agents
Autor/in / Beteiligte Person:	KHALLAF, Hani ; CHEN, Chia-Ta ; CHANG, Liann-Be ; LUPAN, Oleg ; DUTTA, Aniruddha ; HEINRICH, Helge ; SHENOUDA, A ; CHOWA, Lee
Link:	E-Journal im Bestand der UB Hagen? View record from PASCAL Archive
Zeitschrift:	Applied surface science, Jg. 257 (2011), Heft 22, S. 9237-9242
Veröffentlichung:	Amsterdam: Elsevier, 2011
Medientyp:	academicJournal
Umfang:	print, 51 ref
ISSN:	0169-4332 (print)
Schlagwort:	General chemistry, physical chemistry Chimie générale, chimie physique Crystallography Cristallographie cristallogenèse Nanotechnologies, nanostructures, nanoobjects Nanotechnologies, nanostructures, nanoobjets Condensed state physics Physique de l'état condensé Sciences exactes et technologie Exact sciences and technology Physique Physics Etat condense: structure electronique, proprietes electriques, magnetiques et optiques Condensed matter: electronic structure, electrical, magnetic, and optical properties Structure électronique et propriétés électriques des surfaces, interfaces, couches minces et structures de basse dimensionnalité Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Propriétés électriques de couches minces particulières Electrical properties of specific thin films Propriétés optiques, spectroscopie et autres interactions de la matière condensée avec les particules et le rayonnement Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Propriétés optiques des matériaux massifs et des couches minces Optical properties of bulk materials and thin films Constantes optiques: indice de réfraction; constante diélectrique complexe; coefficients d'absorption, de réflexion et de transmission; émissivité Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity Domaines interdisciplinaires: science des materiaux; rheologie Cross-disciplinary physics: materials science; rheology Science des matériaux Materials science Méthodes de dépôt de films et de revêtements; croissance de films et épitaxie Methods of deposition of films and coatings; film growth and epitaxy Electrical properties of specific thin films and layer structures (multilayers, superlattices, quantum wells, wires, and dots) Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity) Composé de métal de transition Transition element compounds Bande interdite Energy gap Conductivité électrique Electrical conductivity Couche mince Thin films Densité porteur charge Carrier density Diffraction RX XRD Dépôt bain chimique Chemical bath deposition Depósito baño químico Effet Hall Hall effect Oxydation Oxidation Oxyde de cadmium Cadmium oxide Cadmio óxido RBS Recuit Annealing Semiconducteur II-VI II-VI semiconductors Séquestrant Complexing agent Secuestrante CdO Group II-VI Semiconductors
Sonstiges:	Nachgewiesen in: PASCAL Archive Sprachen: English Original Material: INIST-CNRS Document Type: Article File Description: text Language: English Author Affiliations: Department of Physics, University of Central Florida, Orlando, FL 32816, United States ; Graduate Institute of Electro-Optical Engineering, Chang Gung University, Kweishan, Taoyuan 333, Tawain, Province of China ; Green Technology Research Center, Chang Gung University, Kweishan, Taoyuan 333, Tawain, Province of China ; Department of Microelectronics and Semiconductor Devices, Technical University of Moldova, 168 Stefan cel Mare Boulevard, 2004 Chisinau, Moldova, Republic of ; Advanced Materials Processing and Analysis Centre, Department of Mechanical, Materials, and Aerospace Engineering University of Central Florida, Orlando, FL 32816, United States ; Central Metallurgical R&D Institute (CMRDI), Tebbin, P.O. Box 87, Helwan, Egypt Rights: Copyright 2015 INIST-CNRS ; CC BY 4.0 ; Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS Notes: Physics and materials science ; Physics of condensed state: electronic structure, electrical, magnetic and optical properties

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Investigation of chemical bath deposition of CdO thin films using three different complexing agents