Predeposition chemistry underlying the formation of germanium films by CVD of tetravinylgermane
In: Chemistry of materials, Jg. 6 (1994), Heft 10, S. 1620-1626
Online
academicJournal
- print, 23 ref
Zugriff:
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Predeposition chemistry underlying the formation of germanium films by CVD of tetravinylgermane
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Autor/in / Beteiligte Person: | HARRISON, P. G ; DE COINTET, C ; OGRAB, D ; PODESTA, D. M ; MAZEROLLES, P ; MORANCHO, R ; REYNES, A |
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Zeitschrift: | Chemistry of materials, Jg. 6 (1994), Heft 10, S. 1620-1626 |
Veröffentlichung: | Washington, DC: American Chemical Society, 1994 |
Medientyp: | academicJournal |
Umfang: | print, 23 ref |
ISSN: | 0897-4756 (print) |
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